The Process Control Division encourages the submission of abstracts on all topics related to process measurement and control. These include: WIS and machine vision; analytics and monitoring, MD and CD control, measurement technologies, field devices, QCS, and DCS, etc.
Abstract suggested topics include:
• Field Devices
• Cross-Directional (CD) Measurement and Control
• Applications of Artificial Intelligence (AI) for Process Control
• Bridging the Gap Between QCS and Quality Lab